The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2011

Filed:

May. 21, 2007
Applicants:

Patrick Y. Hwang, Marion, IA (US);

R. Grover Brown, Clear Lake, IA (US);

Inventors:

Patrick Y. Hwang, Marion, IA (US);

R. Grover Brown, Clear Lake, IA (US);

Assignee:

Rockwell Collins, Inc., Cedar Rapids, IA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 19/20 (2010.01); G01S 19/48 (2010.01); H04W 4/00 (2009.01); G01C 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vertical integrity monitoring method and system are described. The vertical integrity monitoring method includes determining a noise sigma ratio parameter. The method also includes determining two vertical protection limit slopes and an associated covariance matrix. The method further includes determining a vertical integrity limit and set of weights based on the VPL slopes, covariance and the parameter; and applying the set of weights based on the parameter to calculate a vertical solution. An integrity monitoring system may have hardware and/or software embodying the one or more methods described.


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