The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2011

Filed:

Sep. 25, 2008
Applicants:

Xin Jin, Pittsford, NY (US);

Cheng Yang, Pittsford, NY (US);

Inventors:

Xin Jin, Pittsford, NY (US);

Cheng Yang, Pittsford, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08C 1/14 (2006.01); G03G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making polymeric particles having a controlled size and size distribution, and in particular a method for the preparation of chemically prepared toners, via evaporative limited coalescence process, wherein basic silicate salts are employed to remove particulate stabilizer from precipitated polymer particles. The process includes the steps of dispersing polymeric binder materials and optional additives in an organic solvent to form an organic phase. The organic phase is dispersed by high shear agitation in an aqueous phase containing a particulate stabilizer, e.g. colloidal silica, to form a dispersion of small droplets of the organic phase in the aqueous phase. The dispersion is homogenized and the organic solvent is removed from the dispersed particles in the dispersion by evaporation, and polymeric particles are precipitated with particulate stabilizer on the surface thereof, which are then recovered, treated with a basic silicate salt to remove particulate stabilizer, and washed and dried.


Find Patent Forward Citations

Loading…