The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2011
Filed:
Nov. 09, 2007
Eric Shrader, Belmont, CA (US);
Uma Srinivasan, Mountain View, CA (US);
Clark Crawford, Danville, CA (US);
Scott Limb, Palo Alto, CA (US);
Eric Shrader, Belmont, CA (US);
Uma Srinivasan, Mountain View, CA (US);
Clark Crawford, Danville, CA (US);
Scott Limb, Palo Alto, CA (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Abstract
A method for masking regions of photoresist in the manufacture of a soldermask for printed circuit boards is disclosed. Following application of photoresist over patterned traces on a substrate, a sheet-like thin film is applied over the photosensitive material. The thin film may adhere to the photosensitive material by way of the adhesive state of the photosensitive material or by way of an adhesive applied to the photosensitive material or the thin film or carried by the thin film. Digital mask printing may proceed on the surface of the thin film. The photosensitive material may then be exposed through the printed photomask, the thin film (with photomask) removed, and the photosensitive material developed.