The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2011
Filed:
Jul. 03, 2006
Harald Baumann, Osterode/Harz, DE;
Bernd Strehmel, Berlin, DE;
Detlef Pietsch, Badenhausen, DE;
Udo Dwars, Herzberg/Harz, DE;
Tanja Ebhardt, Osterode, DE;
Axel Draber, Osterode, DE;
Harald Baumann, Osterode/Harz, DE;
Bernd Strehmel, Berlin, DE;
Detlef Pietsch, Badenhausen, DE;
Udo Dwars, Herzberg/Harz, DE;
Tanja Ebhardt, Osterode, DE;
Axel Draber, Osterode, DE;
Eastman Kodak Company, Rochester, NY (US);
Abstract
Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X, Xand Xare independently selected from straight-chain or cyclic C-Calkylene and C-Carylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R, Rand Rare independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R, Rand R, and (2) n>2 in at least one of the groups R, Rand R, and (3) at least one group Ris different from H in formula (III).