The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2011
Filed:
Jan. 07, 2010
Tetsuya Endo, Komae, JP;
Einstein Noel Abarra, Hachioji, JP;
Tetsuya Endo, Komae, JP;
Einstein Noel Abarra, Hachioji, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
The present invention provides a sputtering apparatus and a film deposition method capable of forming a magnetic film with reduced variations in the direction of magnetic anisotropy. The sputtering apparatus of the present invention is provided with a rotatable cathode (), a rotatable stage () and a rotatable shielding plate (). The sputtering apparatus controls the rotation of at least one of the cathode (), stage () and shielding plate () so that sputtered particles impinging at an angle formed with respect to a normal line of the substrate () of 0° or more and 50° or less out of sputtered particles generated from the target () during sputtering are made to impinge on the substrate ().