The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
May. 27, 2008
Grimes Roger, Fall City, WA (US);
Xinhai Zhu, Pleasanton, CA (US);
Grimes Roger, Fall City, WA (US);
XinHai Zhu, Pleasanton, CA (US);
Livermore Software Technology Corporation, Livermore, CA (US);
Abstract
Systems and methods of limiting contact penetration in numerical simulation of non-linear structure response using implicit finite element analysis are described. According to one aspect, a finite element analysis (FEA) model of a structure is defined as a number of nodes and elements based on geometry and material properties of the structure. A time-marching analysis of the FEA model is then performed. The time-marching analysis results contain a number of solutions of non-linear structure response at respective time steps. Solution at each time step requires at least one iteration to compute. Non-linear structure response is determined in the following manner: 1) determining a search direction; 2) calculating a contact penetration parameter in the search direction; and 3) finding a minimum energy imbalance location along the search direction as a solution which is further restricted by the CPP such that contact penetration of the structure is substantially limited.