The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2011

Filed:

Jan. 31, 2007
Applicants:

Richard G. Burda, Pleasant Valley, NY (US);

Alfred Degbotse, Colchester, VT (US);

Brian T. Denton, Winooski, VT (US);

Kenneth J. Fordyce, Hurley, NY (US);

Sanjay Hegde, S. Burlington, VT (US);

Robert J. Milne, Jericho, VT (US);

Sameer T. Shikalgar, Wappingers Falls, NY (US);

Guogang Zuo, Yorktown Heights, NY (US);

Inventors:

Richard G. Burda, Pleasant Valley, NY (US);

Alfred Degbotse, Colchester, VT (US);

Brian T. Denton, Winooski, VT (US);

Kenneth J. Fordyce, Hurley, NY (US);

Sanjay Hegde, S. Burlington, VT (US);

Robert J. Milne, Jericho, VT (US);

Sameer T. Shikalgar, Wappingers Falls, NY (US);

Guogang Zuo, Yorktown Heights, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, system, and program storage device for implementing the method of controlling a manufacturing system, wherein the method comprises providing a plurality of workpieces to be processed on a processing tool, the plurality of workpieces located at processing stations prior to the processing tool, determining auxiliary equipment allocation needs for the processing tool based on characteristics associated with the plurality of workpieces prior to the workpieces arriving at the processing tool, and sending auxiliary equipment to the processing tool based on the allocation needs prior to the workpieces arriving at the processing tool. According to an embodiment of the invention, the processing tool comprises a photolithographic system, the auxiliary equipment comprises a reticle, and the plurality of workpieces comprise semiconductor substrates.


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