The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Sep. 10, 2007
Toshitaka Amano, Kawachi-gun, JP;
Toshitaka Amano, Kawachi-gun, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a projection optical system, an original stage having a first reference mark, a substrate stage, and a measurement instrument configured to measure first image properties of a mark formed on the original with the projection optical system, via the original and the projection optical system. The measurement instrument is also configured to measure the properties of a second image with the projection optical system of the first reference mark, via the reference mark and the projection optical system. The exposure apparatus also includes a calculating unit for calculating a first heat change coefficient due to the projection optical system and a second heat change coefficient due to the original, with relation to the properties of images formed by the projection optical system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile