The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Oct. 25, 2007
Dae Ho Choo, Seongnam-Si, KR;
Yeon Hee Yu, Suwon-Si, KR;
Hong Gyun Kim, Cheonan-Si, KR;
Abstract
A method of forming a wire grid polarizing pattern across the relatively large surface area of a display substrate includes using a nano imprint lithograph process wherein wire grid polarizing patterns are formed by bonding a stamp having a stamping area substantially smaller than that of the substrate with successive reticle areas of the substrate, where the substrate has a photosensitive film deposited thereon and where the stamping is such that recesses having a predetermined depth are formed in the photosensitive film, and then filling the recesses with an insulating film and etching it using the insulating film as a mask. Since mechanical misalignment margin is acceptable from one reticle area to the next, a wire grid polarizing pattern with a uniform line width and spacings in each reticle area can be formed on a substrate having a large area.