The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2011

Filed:

Apr. 30, 2008
Applicants:

Christopher H Weis, Riverton, UT (US);

Ronald K Eyre, Orem, UT (US);

Stewart N Middlemiss, Salt Lake City, UT (US);

David Iverson, Highland, UT (US);

Inventors:

Christopher H Weis, Riverton, UT (US);

Ronald K Eyre, Orem, UT (US);

Stewart N Middlemiss, Salt Lake City, UT (US);

David Iverson, Highland, UT (US);

Assignee:

Smith International, Inc., Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing an ultrahard compact includes assembling a mass of ultrahard material with a mass of substrate material such that the mass of ultrahard material extends radially outward a greater extent than the substrate material to compensate for a difference in the radial shrinkage of the ultrahard material compared to the substrate material during a sintering process. The method may further includes subjecting the assembled compact to a high pressure high temperature process mat results in the forming of an ultrahard compact including an ultrahard layer integrally bonded with a substrate.


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