The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Dec. 10, 2008
Toshiaki Ueda, Kawasaki, JP;
Toshiaki Ueda, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A semiconductor integrated circuit design method has extracting connection-permitted patterns which are permitted to connect to each other in a layout pattern, disconnection-permitted patterns which exercise no effect on a circuit operation even when disconnected in the layout pattern, and a multicut via which suffices when connection is made to at least one via thereof in the layout pattern, by using a net list and a cell library; conducting LRC (Lithography Rule Check) processing on the layout pattern to which a correction pattern resulting from OPC (Optical Proximity Correction) processing is added, and detecting an error part; and judging the error part either as a false error when the error part is included in the connection-permitted patterns, the disconnection-permitted patterns, or the multicut via extracted, or as a true error when the error part is not included in the connection-permitted patterns, the disconnection-permitted patterns, or the multicut via extracted, and making a pattern correction to the error part when the error part is judged as the true error.