The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Nov. 13, 2006
Evgueni Parilov, Brooklyn, NY (US);
Mary Potasek, Princeton, NJ (US);
Evgueni Parilov, Brooklyn, NY (US);
Mary Potasek, Princeton, NJ (US);
Simphotek, Inc., Newark, NJ (US);
Abstract
The exemplary embodiments of the method, system, software arrangement and computer-accessible medium according to the present invention facilitates an analysis of interactions between nonlinear absorbing materials and an incident electromagnetic wave based on material properties and characteristics of the incident beam of the electromagnetic energy. Using the exemplary embodiments of the present invention, it is possible to determine laser beam propagation in a variety of multiphoton absorbing materials. Energy levels associated with such materials, which may be associated with various electron absorption and/or relaxation phenomena, may be added to and/or removed from the analysis. Incident laser beams can vary from continuous wave to attoseconds in duration and a numerical solution can be obtained that is radially and/or temporally dependent. Certain exemplary embodiments of the present invention can also be used to determine certain contributions of individual electronic energy levels within the materials to the total 15 absorption.