The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Jun. 17, 2008
Moon Youn Jung, Daejeon, KR;
Dong Ho Shin, Daejeon, KR;
Young Jun Kim, Daejeon, KR;
SE Ho Park, Daejeon, KR;
Hyeon Bong Pyo, Daejeon, KR;
Chang Auck Choi, Daejeon, KR;
Moon Youn Jung, Daejeon, KR;
Dong Ho Shin, Daejeon, KR;
Young Jun Kim, Daejeon, KR;
Se Ho Park, Daejeon, KR;
Hyeon Bong Pyo, Daejeon, KR;
Chang Auck Choi, Daejeon, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Abstract
The present invention relates to a programmable mask used in a photolithography process for fabricating a biomolecule array and a method of fabricating a biomolecule array using the same and, more particularly, to a programmable mask which can increase a contrast ratio of transmittance versus shielding of light incident to a liquid crystal which constitutes each pixel by irradiating parallel ultraviolet ('UV') light generated from an external parallel light exposure device to a certain cell and using a vertically aligned liquid crystal panel or an LC panel having no spacer, and a method of fabricating a biomolecule array using the same.