The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2011

Filed:

Oct. 31, 2007
Applicants:

Nathan Ray Perkins, Fort Collins, CO (US);

Timothy Arthur Valade, Fort Collins, CO (US);

Albert William Wang, Fort Collins, CO (US);

Inventors:

Nathan Ray Perkins, Fort Collins, CO (US);

Timothy Arthur Valade, Fort Collins, CO (US);

Albert William Wang, Fort Collins, CO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/338 (2006.01); H01L 21/336 (2006.01); H01L 21/3205 (2006.01); H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating a semiconductor device, the method comprises forming a mask layer over a compound semiconductor substrate; and patterning a photoresist over the mask layer. The method comprises etching a portion of the mask layer beneath the photoresist; forming a hardmask over the substrate and not over the mask layer; removing the mask layer; etching to form and opening down to the substrate; and forming a gate in the opening.


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