The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Nov. 08, 2007
Thomas Kuepper, Bad Gandersheim, DE;
Lars Bewig, Bad Gandersheim, DE;
Christoph Moelle, Mainz, DE;
Lars Brandt, Kreiensen, DE;
Thomas Niklos, Griesheim, DE;
Thomas Kuepper, Bad Gandersheim, DE;
Lars Bewig, Bad Gandersheim, DE;
Christoph Moelle, Mainz, DE;
Lars Brandt, Kreiensen, DE;
Thomas Niklos, Griesheim, DE;
Schott AG, , DE;
Abstract
A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.