The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Dec. 13, 2007
Waltraud Werdecker, Hanau, DE;
Rolf Gerhardt, Hammersbach, DE;
Juergen Weber, Kleinostheim, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
Methods for producing a quartz glass component with reflector layer are known in which a reflector layer composed of quartz glass acting as a diffuse reflector is produced on at least part of the surface of a substrate body composed of quartz glass. In order, taking this as a departure point, to specify a method which enables cost-effective and reproducible production of uniform SiOreflector layers on quartz glass components, it is proposed according to the invention that the reflector layer is produced by thermal spraying by means of SiOparticles being fed to an energy carrier, being incipiently melted or melted by means of said energy carrier and being deposited on the substrate body. In the case of a quartz glass component obtained according to the method, the SiOreflector layer is formed as a layer which is produced by thermal spraying and has an opaque effect and which is distinguished by freedom from cracks and uniformity.