The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2011

Filed:

Dec. 21, 2005
Applicants:

Shojiro Komatsu, Tsukuba, JP;

Yusuke Moriyoshi, Tsukuba, JP;

Katsuyuki Okada, Tsukuba, JP;

Inventors:

Shojiro Komatsu, Tsukuba, JP;

Yusuke Moriyoshi, Tsukuba, JP;

Katsuyuki Okada, Tsukuba, JP;

Assignee:

National Institute for Materials Science, Tsukuba-Shi, Ibaraki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 35/00 (2006.01); C01B 21/064 (2006.01); C01B 25/00 (2006.01); C01D 3/02 (2006.01); H01J 11/04 (2006.01); C23C 14/28 (2006.01); C23C 16/00 (2006.01); B05D 3/02 (2006.01); B05D 3/00 (2006.01); H05H 1/24 (2006.01); B01J 19/12 (2006.01); H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

Based on designs concerning boron nitride thin-films each including boron nitride crystals in acute-ended shapes excellent in field electron emission properties, and designs of emitters adopting such thin-films, it is aimed at appropriately controlling a distribution state of such crystals to thereby provide an emitter having an excellent efficiency and thus requiring only a lower threshold electric field for electron emission. In a design of a boron nitride thin-film emitter comprising crystals that are each represented by a general formula BN, that each include spbonded boron nitride, spbonded boron nitride, or a mixture thereof, and that each exhibit an acute-ended shape excellent in field electron emission property; there is controlled an angle of a substrate relative to a reaction gas flow upon deposition of the emitter from a vapor phase, thereby controlling a distribution state of the crystals over a surface of the thin-film.


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