The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Aug. 27, 2007
Josh H. Golden, Santa Cruz, CA (US);
Peter I. Porshvev, San Jose, CA (US);
Michael R. Woolston, San Jose, CA (US);
Cormac Kissane, San Mateo, CA (US);
Josh H. Golden, Santa Cruz, CA (US);
Peter I. Porshvev, San Jose, CA (US);
Michael R. Woolston, San Jose, CA (US);
Cormac Kissane, San Mateo, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the invention generally provide a method and an apparatus for treating waste effluents from substrate polishing processes, such as from an electrochemical mechanical polishing (ECMP) process. In one embodiment, a method for treating a waste effluent mixture generated during a substrate process is provided which includes flowing a waste effluent comprising chelated metal complexes from a substrate process system, combining an oxidizing agent and the waste effluent to produce free chelators, flowing the waste effluent through an organoclay media and an activated carbon media to remove the free chelators, and flowing the waste effluent through an anion exchange resin to remove metal ions and produce a waste water.