The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Aug. 10, 2007
Applicants:
Lawrence E. Gebhart, Dayton, OH (US);
E. Jennings Taylor, Troy, OH (US);
Inventors:
Lawrence E. Gebhart, Dayton, OH (US);
E. Jennings Taylor, Troy, OH (US);
Assignee:
Faraday Technology, Inc., Clayton, OH (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/08 (2006.01); C25D 7/00 (2006.01); C25D 21/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for establishing more uniform deposition across one or more faces of a workpiece in an electroplating process. The apparatus employs eductors in conjunction with a flow dampener member and other measures to provide a more uniform current distribution and a more uniform metal deposit distribution as reflected in a coefficient of variability that is lower than conventional processes.
Gebhart, Lawrence. (2011). Method of operating an electroplating cell with hydrodynamics facilitating more uniform deposition on a workpiece with through holes (U.S. Patent No. 7947161). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7947161
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile