The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Oct. 18, 2005
Paul Olof Meinander, Grankulla, FI;
Paul Olof Meinander, Grankulla, FI;
Pom Technology Oy AB, Helsinki, FI;
Abstract
The present invention relates to a method for improving the efficiency of gas removal wherein gas-enriched process liquid () is introduced tangentially into a vertical essentially cylindrical vessel () and thereafter removed at the bottom of the vessel. By means of centrifugal force gas () is brought to enrich in a part () of the liquid (). This part () of liquid () having an enriched gas content () is redirected to at least one vertical means () arranged centrally in the vessel (), and separately removed therefrom. The present invention also relates to a de-gassing arrangement in an arrangement including at least one vertical essentially cylindrical vessel (). Said vessel () includes at least one tangentially arranged inlet () for gas-enriched liquid and at least one discharge () for de-gassed liquid, which discharge is arranged at the lower portion of the vessel (). The vessel () includes centrally arranged vertical means () having one or several inlets () for gas-enriched liquid (). Said vertical means () include one or several separate discharges for this portion of the liquid (), portions thereof () and/or gas ().