The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2011

Filed:

Jul. 03, 2009
Applicant:

Debra Williams, Sterling, NY (US);

Inventor:

Debra Williams, Sterling, NY (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B43L 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for drafting a framework for a pattern and a method of using the apparatus is presented. The apparatus includes a generally rigid planer structure. A pivot point includes a pivot point aperture extending through the rigid planer structure for enabling scribing a center point of the framework and rotating the rigid planer structure about the center point. A plurality of lines pass through the pivot point. Each of the plurality of lines includes a plurality of apertures for enabling scribing marks for forming a basis for lines in the framework. At least one line of generally equally spaced longitudinal apertures, wherein each of the longitudinal apertures is at a first fixed radial distance from the pivot point, enables scribing a circle for the framework, where the circle is scribed by rotation of the rigid planer structure about the pivot point.


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