The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Mar. 14, 2008
Kyouhei Watanabe, Machida, JP;
Masaki Kurihara, Koza-gun, JP;
Hitoshi Shindo, Hadano, JP;
Nobuhiko Sato, Yokohama, JP;
Yasuhiro Sekine, Yokohama, JP;
Masataka Ito, Chigasaki, JP;
Kyouhei Watanabe, Machida, JP;
Masaki Kurihara, Koza-gun, JP;
Hitoshi Shindo, Hadano, JP;
Nobuhiko Sato, Yokohama, JP;
Yasuhiro Sekine, Yokohama, JP;
Masataka Ito, Chigasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data that represent a transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method, to acquire the transmitted light distribution, and generates mask pattern data that represent an arrangement of the shields, based on the determination.