The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2011

Filed:

Feb. 22, 2006
Applicants:

Daniel L'hermite, Les Molieres, FR;

Patrick Mauchien, Palaiseau, FR;

Jean-luc Lacour, Villebon sur Yvette, FR;

Inventors:

Daniel L'Hermite, Les Molieres, FR;

Patrick Mauchien, Palaiseau, FR;

Jean-Luc Lacour, Villebon sur Yvette, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for physicochemical analysis of a material during its ablation with a pulsed laser. The method uses the ratio of intensity levels of two emission lines of a tracer element derived from plasma generated by the laser beam to characterize the plasma excitation temperature. The method determines concentration of an element to be measured in the plasma using standard measurements indicating correspondence between a concentration of the element to measured and a variation of intensity of an emission line and different ratios between intensity levels of two emission lines of the tracer element, the ratios representing the plasma temperature.


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