The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2011

Filed:

Jan. 28, 2005
Applicants:

Janet Boggs, Crawfordsville, IN (US);

Stephan Brandstadter, Indianapolis, IN (US);

John Chien, West Lafayette, IN (US);

Vimal Sharma, West Lafayette, IN (US);

E. Bradley Edwards, Lafayette, IN (US);

Vicki Hedrick, Brookston, IN (US);

Andrew Jackson, West Lafayette, IN (US);

Gregory Leman, Waco, TX (US);

Edward Norman, Chester Springs, PA (US);

Robert Kaufman, St. Louis, MO (US);

Inventors:

Janet Boggs, Crawfordsville, IN (US);

Stephan Brandstadter, Indianapolis, IN (US);

John Chien, West Lafayette, IN (US);

Vimal Sharma, West Lafayette, IN (US);

E. Bradley Edwards, Lafayette, IN (US);

Vicki Hedrick, Brookston, IN (US);

Andrew Jackson, West Lafayette, IN (US);

Gregory Leman, Waco, TX (US);

Edward Norman, Chester Springs, PA (US);

Robert Kaufman, St. Louis, MO (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/00 (2006.01); C11D 3/24 (2006.01); C07C 17/00 (2006.01); C07C 19/08 (2006.01); C07C 21/18 (2006.01); C07C 22/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CFgroups with reactants having cyclic groups. R-compositions such as R-intermediates, R-surfactants, R-monomers, R-monomer units, R-metal complexes, R-phosphate esters, R-glycols, R-urethanes, and/or R-foam stabilizers. The Rportion can include at least two —CFgroups, at least three —CFgroups, and/or at least two —CFgroups and at least two —CH— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R-monomer unit. Compositions are provided that include a substrate having a R-composition thereover. Aqueous Film Forming Foam ('AFFF') formulations are provided that can include R-surfactants and/or R-foam stabilizers are provided.


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