The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Dec. 16, 2005
Israel Wagner, Sargans, CH;
Israel Wagner, Sargans, CH;
Oerlikon Solar AG, Truebbach, Truebbach, CH;
Abstract
The magnetron sputtering arrangement () comprises a target arrangement () comprising a target () having a sputtering surface () the shape of which defines a first (Aand a second axis (A) being mutually perpendicular and being, at least approximately, axes of mirror-symmetry of the sputtering surface; a magnet arrangement () generating a magnetic field above said sputtering surface; and a drive () adapted to establishing a substantially transitional relative movement between said magnetron magnetic field and said sputtering surface. Said relative movement describes a path () defining a third (A) and a fourth axis (A) being mutually perpendicular and being, at least approximately, axes of mirror-symmetry of the path (). Said third axis is at least approximately parallel to said first axis (A), and said path () has at least two pointed corners (), each corner located on one of said third axis (A) and said fourth axis (A). Preferably, the relative movement is a repetitive movement, and preferably the path describes substantially the shape of a rhombus. The magnetron sputtering arrangement () may comprise at least two of said target arrangements (), magnet arrangements () and drives ().