The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Feb. 20, 2007
Applicant:
Haiqing Wei, Jan Jose, CA (US);
Inventor:
Haiqing Wei, Jan Jose, CA (US);
Assignee:
oLambda, Inc., Los Altos, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method, system, and related computer program products for computer simulation of a photolithographic process is described. In one embodiment, a method for designing an integrated circuit is provided. The geometrical design intent and process condition values are received for at least one process variation associated with a photolithographic process to be used in fabricating the integrated circuit. The photolithographic process is simulated at the process condition values using one or more models characterizing the photolithographic process and the geometrical design intent to generate simulation results.