The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Apr. 30, 2008
Hidefumi Mukai, Kawasaki, JP;
Shinji Yamaguchi, Tokyo, JP;
Yukiyasu Arisawa, Tsukuba, JP;
Toshiya Kotani, Machida, JP;
Hidefumi Mukai, Kawasaki, JP;
Shinji Yamaguchi, Tokyo, JP;
Yukiyasu Arisawa, Tsukuba, JP;
Toshiya Kotani, Machida, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A photomask is washed and at least one physical amount of transmittance and phase difference of the photomask, dimension of a pattern, height of the pattern and a sidewall shape of the pattern is measured. After this, the two-dimensional shape of a borderline pattern previously determined for the photomask is measured. Lithography tolerance is derived by performing a lithography simulation for the measured two-dimensional shape by use of the measured physical amount. Then, whether the photomask can be used or not is determined based on the derived lithography tolerance.