The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Nov. 28, 2006
Applicants:
Roger B. Proksch, Santa Barbara, CA (US);
Roger C. Callahan, Goleta, CA (US);
Inventors:
Roger B. Proksch, Santa Barbara, CA (US);
Roger C. Callahan, Goleta, CA (US);
Assignee:
Asylum Research Corporation, Goleta, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Systems and techniques for varying a scan rate in a measurement instrument. The techniques may be used in scanning probe instruments, including atomic force microscopes (AFMs) and other scanning probe microscopes, as well as profilometers and confocal optical microscopes. This allows the selective imaging of particular regions of a sample surface for accurate measurement of critical dimensions within a relatively small data acquisition time.