The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Dec. 04, 2006
Hiroaki Ohashi, Iwaki, JP;
Masaru Kagoshima, Iwaki, JP;
Yoshiki Shigaki, Iwaki, JP;
Kureha Corporation, Tokyo, JP;
Abstract
An apparatus for continuous high temperature gas treatment of particulate matter including a starting material supply port () through which starting particulate matter is supplied from an upper part of the apparatus; a treatment gas supply port () through which a treating gas is supplied; a product discharge port () through which a product after treatment is discharged from a lower part of the apparatus; a treatment chamber () in which the particulate matter is treated with the treatment gas; a gas-solid separation chamber () provided in fluid communication with an upper part of the treatment chamber (); and a cooling chamber () provided in fluid communication with a lower part of the treatment chamber (). A heater () is provided on the outer periphery of the upper part of the treatment chamber (), and a cooler () is provided on the outer periphery of the cooling chamber ().