The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Oct. 26, 2007
Applicants:
Sean Wong, Karlsruhe, DE;
Georg Von Freymann, Karlsruhe, DE;
Martin Wegener, Karlsruhe, DE;
Geoffrey Alan Ozin, Toronto, CA;
Inventors:
Sean Wong, Karlsruhe, DE;
Georg von Freymann, Karlsruhe, DE;
Martin Wegener, Karlsruhe, DE;
Geoffrey Alan Ozin, Toronto, CA;
Assignee:
Forschungszentrum Karlsruhe GmbH, Karlsruhe, DE;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); C25F 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.