The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Aug. 28, 2006
Shain-jer Doong, Kildeer, IL (US);
Raja A. Jadhav, Naperville, IL (US);
Francis Lau, Darien, IL (US);
Shain-Jer Doong, Kildeer, IL (US);
Raja A. Jadhav, Naperville, IL (US);
Francis Lau, Darien, IL (US);
Gas Technology Institute, Des Plaines, IL (US);
Abstract
A system for the selective removal of CO, HS, and Hfrom a gaseous fluid mixture comprising CO, HS, and H, which system includes a first membrane section having a nonporous metal oxide membrane, a second membrane section having a CO-selective membrane, and a third membrane section having an H-selective membrane. Each membrane section has a feed side and a permeate side and the membrane sections are arranged in series whereby the gaseous fluid mixture contacts the feed side, in sequence, of the first membrane section, the second membrane section and the third membrane section, resulting first in the separation or removal of HS, second in the separation or removal of CO, and third in the separation or removal of H. The process can be used to process synthesis gas generated from the gasification or reforming of carbonaceous materials for hydrogen production and carbon dioxide capture.