The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2011
Filed:
Nov. 30, 2007
Mao-jen Wu, Kaohsiung, TW;
Jian-shian Lin, Yilan County, TW;
Chih-chieh Su, Taichung County, TW;
Che-lung Hsu, Taipei, TW;
Zong-ru Tu, Keelung, TW;
Jenq-yang Chang, Taipei, TW;
Mao-Jen Wu, Kaohsiung, TW;
Jian-Shian Lin, Yilan County, TW;
Chih-Chieh Su, Taichung County, TW;
Che-Lung Hsu, Taipei, TW;
Zong-Ru Tu, Keelung, TW;
Jenq-Yang Chang, Taipei, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A diffraction grating recording medium including a waveguide layer and a grating structure layer is provided. The waveguide layer has a reflective surface and a light incident surface, in which a thickness of the waveguide layer is between 100 nanometers and 2 micrometers, and the reflective surface reflects a light that enters the waveguide layer from the light incident layer. The grating structure layer is disposed on the light incident surface of the waveguide layer, in which the grating structure layer has a plurality of diffractive elements, and the arranging period of the diffractive elements is between 50 nanometers and 900 nanometers.