The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2011
Filed:
Nov. 06, 2009
Sung-hee Kim, Gyeonggi-Do, KR;
Soon-sung Yoo, Gyeonggi-Do, KR;
Jin-wuk Kim, Gyeonggi-Do, KR;
Byung-geol Kim, Gyeonggi-Do, KR;
Byung-uk Kim, Gyeonggi-Do, KR;
Ki-beom Lee, Gyeonggi-Do, KR;
Byong-hoo Kim, Gyeonggi-Do, KR;
Seung-hyup Shin, Gyeonggi-Do, KR;
Jun-youg Song, Gyeonggi-Do, KR;
Myoung-soo Lee, Gyeonggi-Do, KR;
Sung-Hee Kim, Gyeonggi-Do, KR;
Soon-Sung Yoo, Gyeonggi-Do, KR;
Jin-Wuk Kim, Gyeonggi-Do, KR;
Byung-Geol Kim, Gyeonggi-Do, KR;
Byung-Uk Kim, Gyeonggi-Do, KR;
Ki-Beom Lee, Gyeonggi-Do, KR;
Byong-Hoo Kim, Gyeonggi-Do, KR;
Seung-Hyup Shin, Gyeonggi-Do, KR;
Jun-Youg Song, Gyeonggi-Do, KR;
Myoung-Soo Lee, Gyeonggi-Do, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.