The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2011
Filed:
Jun. 22, 2007
Thomas K. Gaylord, Atlanta, GA (US);
Justin L. Stay, Suwanee, GA (US);
Jonathan S. Maikisch, Atlanta, GA (US);
James D. Meindl, Marietta, GA (US);
Thomas K. Gaylord, Atlanta, GA (US);
Justin L. Stay, Suwanee, GA (US);
Jonathan S. Maikisch, Atlanta, GA (US);
James D. Meindl, Marietta, GA (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
Abstract
Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and/or diffractive elements contained in or on a body element. The photo-mask can be used to simultaneously produce multiple surface-relief grating diffractive devices in a recording material. The photo-mask enables the surface-relief grating diffractive devices to be produced in large quantities while significantly reducing the cost and labor required.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile