The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2011

Filed:

Nov. 27, 2007
Applicants:

Yoshihide Nagata, Kanagawa, JP;

Atsushi Sato, Kanagawa, JP;

Hitomu Watanabe, Kanagawa, JP;

Ji Woo Kim, Yongin-si, KR;

Inventors:

Yoshihide Nagata, Kanagawa, JP;

Atsushi Sato, Kanagawa, JP;

Hitomu Watanabe, Kanagawa, JP;

Ji Woo Kim, Yongin-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-si, Gyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing fine patterns includes providing a base portion having a plurality of protruding portions with recess portions therebetween, depositing a material layer on the protruding portions, the material layer including grooves in an upper surface thereof and a plurality of material portions on respective protruding portions, the material portions being in direct contact with adjacent material portions to form contact surfaces therebetween and to overhang corresponding recess portions between the adjacent material portions, and wet etching the material portions through the grooves and contact surfaces to form pattern portions.


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