The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Oct. 01, 2006
Tzu Yin Chiu, Shanghai, CN;
Tzu Yin Chiu, Shanghai, CN;
Abstract
A method for illuminating an object for selectively patterning a photosensitive material overlying the object using an array of mirror devices. The method includes applying electromagnetic radiation using a flood beam onto an array of mirror devices. Each of the mirror devices is associated with a pixel for a pattern to be exposed onto the photosensitive material. The method also includes selectively actuating one or more mirrors on the array to deflect corresponding portions of the beam onto corresponding portions of the photosensitive material to expose the portions of the photosensitive material on the object. The method maintains one or more other mirrors in a selected position(s) to maintain corresponding other portions of the photosensitive material free from exposure. Preferably, the combination of exposed and unexposed portions forms the pattern exposed onto the photosensitive material.