The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Jun. 30, 2007
Calvin K. LI, Fremont, CA (US);
Yung-tin Chen, Santa Clara, CA (US);
En-hsing Chen, Fremont, CA (US);
Paul Wai Kie Poon, Fremont, CA (US);
Calvin K. Li, Fremont, CA (US);
Yung-Tin Chen, Santa Clara, CA (US);
En-Hsing Chen, Fremont, CA (US);
Paul Wai Kie Poon, Fremont, CA (US);
SanDisk Corporation, Milpitas, CA (US);
Abstract
Test structures are formed during semiconductor processing. The test structures allow performance characteristics to be monitored as the process proceeds. The test structures are formed with a single mask that is used in a manner that also allows alignment marks to be formed which do not interfere with one another as subsequent levels are patterned. The manner of using the mask also allows different types of test structures having different features to be formed. The different types of test structures can provide insight into performance characteristics of different types of devices.