The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Apr. 13, 2010
Keisuke Ogata, Tokyo, JP;
Kenzo Fukuyoshi, Tokyo, JP;
Tadashi Ishimatsu, Tokyo, JP;
Mitsuhiro Nakao, Tokyo, JP;
Satoshi Kitamura, Tokyo, JP;
Keisuke Ogata, Tokyo, JP;
Kenzo Fukuyoshi, Tokyo, JP;
Tadashi Ishimatsu, Tokyo, JP;
Mitsuhiro Nakao, Tokyo, JP;
Satoshi Kitamura, Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method includes successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by dry etching, and the rest of the plurality of the color filter pattern is formed by photolithography.