The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Sep. 10, 2004
Takakuni Ueno, Tokyo, JP;
Takakuni Ueno, Tokyo, JP;
Nabtesco Corporation, Tokyo, JP;
Abstract
A method and an apparatus includes using a planar plotting mask which can continuously change a mask image; continuously moving the planar plotting mask with reference to the surface of the photocurable resin composition and exposing the surface of a photocurable resin composition to light by way of the planar plotting mask while continuously changing a mask image of the planar plotting mask in accordance with a cross-sectional profile pattern of an optically-cured resin layer to be formed and in synchronism with movement of the planar plotting mask, to thus form an optically-cured resin layer having a predetermined cross-sectional profile pattern; and performing building operation such that boundary areas among adjacent plotted areas in the optically-cured resin layer become unnoticeable in a finally-obtained stereolithographic three-dimensional object.