The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Sep. 05, 2001
Applicants:
Masataka Hirose, Tsukuba, JP;
Shingo Nakamura, Settsu, JP;
Mitsushi Itano, Settsu, JP;
Hirokazu Aoyama, Settsu, JP;
Inventors:
Masataka Hirose, Tsukuba, JP;
Shingo Nakamura, Settsu, JP;
Mitsushi Itano, Settsu, JP;
Hirokazu Aoyama, Settsu, JP;
Assignee:
Daikin Industries, Ltd., Osaka-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01);
U.S. Cl.
CPC ...
Abstract
A dry etching gas that comprises a compound having a CFCF fragment directly bonded to a double bond (provided that the compound is exclusive of CFCF═CFCF═CF). Said dry etching gas permits the formation of a pattern such as a contact hole with a high aspect ratio.