The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7929269 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 19, 2011

Filed:

Sep. 04, 2008
Applicants:

David Michael Rusinko, Jr., Parma Heights, OH (US);

Marc Schaepkens, Clifton Park, NY (US);

Wanxue Zeng, Guilderland Center, NY (US);

Inventors:

David Michael Rusinko, Jr., Parma Heights, OH (US);

Marc Schaepkens, Clifton Park, NY (US);

Wanxue Zeng, Guilderland Center, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01T 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.


Find Patent Forward Citations

Rusinko, Jr., David. (2011). Wafer processing apparatus having a tunable electrical resistivity (U.S. Patent No. 7929269). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7929269

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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