The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
May. 31, 2008
Bryan H. Fong, Los Angeles, CA (US);
Joseph S. Colburn, Malibu, CA (US);
John Ottusch, Malibu, CA (US);
Daniel F. Sievenpiper, Los Angeles, CA (US);
John L. Visher, Malibu, CA (US);
Bryan H. Fong, Los Angeles, CA (US);
Joseph S. Colburn, Malibu, CA (US);
John Ottusch, Malibu, CA (US);
Daniel F. Sievenpiper, Los Angeles, CA (US);
John L. Visher, Malibu, CA (US);
HRL Laboratories, LLC, Malibu, CA (US);
Abstract
A method and system for determining an optimized artificial impedance surface is disclosed. An artificial impedance pattern is calculated on an impedance surface using an optical holographic technique given an assumed surface wave profile and a desired far field radiation pattern. Then, an actual surface wave profile produced on the impedance surface from the artificial impedance pattern, and an actual far field radiation pattern produced by the actual surface wave profile are calculated. An optimized artificial impedance pattern is then calculated by iteratively re-calculating the artificial impedance pattern from the actual surface wave profile and the desired far field radiation pattern. An artificial impedance surface is determined by mapping the optimized artificial impedance pattern onto a representation of a physical surface.