The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

Oct. 28, 2005
Applicants:

Dana Craig Bookbinder, Corning, NY (US);

Kenneth Edward Hrdina, Horseheads, NY (US);

Glenn Eric Kohnke, Corning, NY (US);

Lisa Anne Moore, Corning, NY (US);

Susan Lee Schiefelbein, Ithaca, NY (US);

Charlene Marie Smith, Corning, NY (US);

Ulrich W H Neukirch, Painted Post, NY (US);

Inventors:

Dana Craig Bookbinder, Corning, NY (US);

Kenneth Edward Hrdina, Horseheads, NY (US);

Glenn Eric Kohnke, Corning, NY (US);

Lisa Anne Moore, Corning, NY (US);

Susan Lee Schiefelbein, Ithaca, NY (US);

Charlene Marie Smith, Corning, NY (US);

Ulrich W H Neukirch, Painted Post, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03B 32/00 (2006.01); C03B 15/00 (2006.01); C03B 17/00 (2006.01); C03B 19/00 (2006.01); C03B 19/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].


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