The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

Oct. 16, 2003
Applicants:

David M. Thompson, Williamsville, NY (US);

Cynthia A. Hoover, Grand, NY (US);

John D. Peck, West Seneca, NY (US);

Michael M. Litwin, Cheektowaga, NY (US);

Inventors:

David M. Thompson, Williamsville, NY (US);

Cynthia A. Hoover, Grand, NY (US);

John D. Peck, West Seneca, NY (US);

Michael M. Litwin, Cheektowaga, NY (US);

Assignee:

Praxair Technology, Inc., Danbury, CT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed herein is a process for producing a film, coating or powder employing a metallocene or metallocene-like precursor having the general formula CpMCp', where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentadienyl or cyclopentadienyl-like, e.g., indenyl, moiety that includes at least one substituent group D, where Dis X; CHX; CHX(C═O)CHX; CHXOCHX; CHX(C═O)OCHX; or CHXO(C═O)CHX; and Cp′ is a second substituted cyclopentadienyl or cyclopentadienyl-like, e.g., indenyl, moiety that includes at least one substituent group D′, where D1′ is X; CHX; CHX(C═O)CHX; CHXOCHX; CHX(C═O)OCHX; or CHXO(C═O)CHX. Dand D′ are different from one another. X is a halogen atom or NO; a1 is an integer between 1 to 8; b1 is an integer between 0 and 2(a1)+1−c1; c1 is an integer between 0 and 2(a1)+1−b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1−c2; and c2 is an integer between 0 and 2(a2)+1−b2. The process can be used in manufacturing or processing electronic devices.


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