The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

Sep. 20, 2005
Applicants:

Geoffrey F. Strouse, Tallahassee, FL (US);

Jeffrey A. Gerbec, Goleta, CA (US);

Donny Magana, Madera, CA (US);

Inventors:

Geoffrey F. Strouse, Tallahassee, FL (US);

Jeffrey A. Gerbec, Goleta, CA (US);

Donny Magana, Madera, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 1/02 (2006.01); H05B 6/64 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for synthesis of high quality colloidal nanoparticles using comprises a high heating rate process. Irradiation of single mode, high power, microwave is a particularly well suited technique to realize high quality semiconductor nanoparticles. The use of microwave radiation effectively automates the synthesis, and more importantly, permits the use of a continuous flow microwave reactor for commercial preparation of the high quality colloidal nanoparticles.


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