The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
May. 15, 2007
Takeshi Fukuda, Osaka, JP;
Junji Hirose, Osaka, JP;
Yoshiyuki Nakai, Osaka, JP;
Tsuyoshi Kimura, Osaka, JP;
Takeshi Fukuda, Osaka, JP;
Junji Hirose, Osaka, JP;
Yoshiyuki Nakai, Osaka, JP;
Tsuyoshi Kimura, Osaka, JP;
Toyo Tire & Rubber Co., Ltd., Osaka, JP;
Abstract
A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side). A method for manufacturing a semiconductor device includes a process of polishing the surface of a semiconductor wafer with this polishing pad. The polishing pad has a polishing layer containing a polishing region and a light-transmitting region, wherein the light-transmitting region includes a polyurethane resin having an aromatic ring density of 2 wt % or less, and the light transmittance of the light-transmitting region is 30% or more in the overall range of wavelengths of 300 to 400 nm.