The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
Dec. 20, 2004
Applicants:
Guangming Dai, Fremont, CA (US);
Junzhong Liang, Fremont, CA (US);
Inventors:
Guangming Dai, Fremont, CA (US);
Junzhong Liang, Fremont, CA (US);
Assignee:
AMO Manufacturing USA, LLC., Santa Ana, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Optical correction methods, devices, and systems reduce optical aberrations or inhibit refractive surgery induced aberrations. Error source control and adjustment or optimization of ablation profiles or other optical data address high order aberrations. A simulation approach identifies and characterizes system factors that can contribute to, or that can be adjusted to inhibit, optical aberrations. Modeling effects of system components facilitates adjustment of the system parameters.