The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2011

Filed:

May. 07, 2007
Applicants:

Ming Jia, Shanghai, CN;

Guiju Song, Shanghai, CN;

Jianming Zheng, Shanghai, CN;

Yu Ning, Beijing, CN;

Kevin George Harding, Niskayuna, NY (US);

Gil Abramovich, Niskayuna, NY (US);

Joseph Benjamin Ross, Cincinnati, OH (US);

Ralph Gerald Isaacs, Cincinnati, OH (US);

Inventors:

Ming Jia, Shanghai, CN;

Guiju Song, Shanghai, CN;

Jianming Zheng, Shanghai, CN;

Yu Ning, Beijing, CN;

Kevin George Harding, Niskayuna, NY (US);

Gil Abramovich, Niskayuna, NY (US);

Joseph Benjamin Ross, Cincinnati, OH (US);

Ralph Gerald Isaacs, Cincinnati, OH (US);

Assignee:

General Electric Company, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/48 (2006.01); G06C 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for inspecting a feature of a part is provided. The method includes obtaining a profile corresponding to the feature using a sensor and projecting the profile onto a compensation plane normal to the feature for generating an updated profile. The method also includes using the updated profile for reducing a measurement error caused by an orientation of the sensor. An inspection system is also provided. The inspection system includes a sensor configured to capture a fringe image of a feature on a part. The inspection system further includes a processor configured to process the fringe image to obtain an initial profile of the feature and to project the initial profile onto a compensation plane normal to the feature.


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