The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Feb. 06, 2007
Christopher William Slinger, Malvern, GB;
Christopher William Slinger, Malvern, GB;
QinetiQ Limited, London, GB;
Abstract
The present invention relates to an imaging system which employs the same principles as coded aperture imaging. High angular resolution coded aperture imagers require a small aperture size and relatively large spacing between the coded aperture array and the detector. At such high resolutions diffraction effects can start to dominate and can degrade image quality. The present invention provides a detector array which receives radiation from a scene via a coded diffractive mask. The coded diffractive mask is designed such that its diffraction pattern at the waveband of interest is a well conditioned coded intensity pattern having a strong autocorrelation function with low sidelobes. Thus radiation reaching the detector array is diffracted by the diffractive mask but in a defined way and it is the diffraction pattern of the mask which provides the coding. The scene image can then be reconstructed using the same techniques as for conventional coded aperture imaging but using the diffraction pattern of the mask as the aperture function. The coded diffractive mask may be a binary or greyscale mask, may operate in reflection or transmission and may be an amplitude or phase modulating mask.