The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Aug. 15, 2007
Alexander N. Lerner, San Jose, CA (US);
Timothy N. Thomas, Portland, OR (US);
Sundar Ramamurthy, Fremont, CA (US);
Alexander N. Lerner, San Jose, CA (US);
Timothy N. Thomas, Portland, OR (US);
Sundar Ramamurthy, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Disclosed is the method and apparatus for annealing semiconductor substrates. One embodiment provides a semiconductor processing chamber comprising a first substrate support configured to support a substrate, a second substrate support configured to support a substrate, a shuttle coupled to the first substrate support and configured to move the first substrate support between a processing zone and a first loading zone, wherein the processing zone having a processing volume configured to alternately accommodating the first substrate support and the second substrate support.